P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive This Test Method is limited

This Test Method is limited to specimens with optical surfaces that are flat or that are spherical with a radius of curvature greater than 10 m

and packaging houses

terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

SEMI MF154-1105 (technical revision)

SEMI E142-0224E (editorial revision)

P04100 - SEMI P41 - XMLによる，検査装置，修正装置およびレビュー装置間で取扱うマスク欠陥データ仕様 Revision:SEMI P41-0304E - Inactive This Test Method is limitedNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2009Japanese Regional Standards Committee20042www. semi. org20043 E 2004923 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to