P01600 - SEMI P16 - 黒鉛炉原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中の錫の測定 StdVol-Gases dimensional and other characteristics and

dimensional and other characteristics and nomenclature

これらの方法は，FPDカラーフィルタ用高抵抗樹脂BMの抵抗値測定に一般的に用いられなければならない。

Only the mechanical interfaces for the tape frame cassette are specified

1  This Guide contains definitions of terms which describe gas pressure in MFCs as used in the semiconductor industry

3  This Test Method measures the flatness of the front wafer surface as it would appear relative to a specified reference plane when the back surface of the water is ideally flat

P01600 - SEMI P16 - 黒鉛炉原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中の錫の測定 StdVol-Gases dimensional and other characteristics andNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeNorth American Microlithography Committee2004711North American Regional Standards Committee20049www. semi. org2004111992 NOTICE: This Standard or Safety Guideline has an Inactive Status because the