Ge Substrate (110)+/- 0.7 degree 5x5x0.5 mm, 1 SP,Sb-doped ,R:0.1-0.5 ohm.cm Vacuum Pumps Use ethanol to clean the

Use ethanol to clean the pressing die before and after use every time

This aluminum foam has the advantages of low density

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Better mechanical strength and toughness to avoid short circuit caused by dendrite growth

Pressure Range: (0

Ge Substrate (110)+/- 0.7 degree 5x5x0.5 mm, 1 SP,Sb-doped ,R:0.1-0.5 ohm.cm Vacuum Pumps Use ethanol to clean theSpecifications Growing Method: CZ Wafer Size: 5x5x0. 5 mm Surface Polishing: one side optical polished Orientation: (110) + 0. 7 degree Surface finish (RMS or Ra) : < 30A Doping: Sb doped Conductor type: N type Resistivity: 0. 1 0. 5 Ohms cm EPD: N A Package: under 1000 class clean room in wafer container Related Product Other Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater