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Ge Wafer (110) N-type Undoped, 4" dia x 0.5 mm, 1SP,R:>50 ohm.cm Temperature Controllers The pressing die cannot be
$384.68
Description
The pressing die cannot be used for pressing powder with particle size < 30 microns
with a customized doctor blade
Such an alumina tube can be used at operating temperatures to 1700 oC in both oxidizing and reducing atmospheres
Option 2PCS 50mm sealing gasket for Stainless Steel Jar of milling machine (80ml) - MTI-PJ-ACC#03
Can test coin cell with diam
Ge Wafer (110) N-type Undoped, 4" dia x 0.5 mm, 1SP,R:>50 ohm.cm Temperature Controllers The pressing die cannot beGe Wafer Specification Growing Method: CZ Orientation: (110) + 0. 5 Deg. Wafer Size: 4" dia x 500 microns Surface Polishing: one side epi polished Surface roughness: < 30 A ( by AFM) Doping: Undoped Conductor type: N type Resistivity: >50 Ohms cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.) Package: under 1000 class clean room Typical Properties of Ge Crystal Structure:
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