83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb Item Description Testing Method D10 – peerflow.io

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ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb Item Description Testing Method D10

$17.19

Quantity
Description

Item Description Testing Method D10 (

To build a DIY electrospinning system

40" x 30" x 28"

Packed in 1000 clss clean room and plastic bag

Edge Exclusion Area 1mm

ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb Item Description Testing Method D10Indium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 1" x 1. 1 mm ( + 0. 2 mm) Sheet Resistance: R: 8 10 ohm sq Nominal ITO film thickness: 180 nm Transmittance of ITO glass: > 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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