SrTiO3 (100) +/-0.5degree 10x10x0.5 mm Epi polished wafer 1 SP - STOa101005S1deg05 Al2O3 The operator sets the blade

The operator sets the blade clearance by adjusting the micrometers and sets up a film width to be coated by adjusting blade width

but it is also available in five-volume ranges for reliable dispensing of volumes from 0

Cutting Depth Max

Surface roughness:            RMS or Ra:~ 10 A(By AFM)

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SrTiO3 (100) +/-0.5degree 10x10x0.5 mm Epi polished wafer 1 SP - STOa101005S1deg05 Al2O3 The operator sets the bladeSrTiO3 single crystal provides a good lattice match to most materials with Perovskite structure. It is an excellent substrate for epitaxial growth of HTS and many oxide thin films. SrTiO3 single crystal has also been used widely for special optical windows and as high quality sputtering target. MTI has the full production line to manufacture first the high purity SrTiO3 powder, then the single crystal boules and finally the epi polished substrates in