Al2O3 Sapphire Wafer, C-plane (0001), 5x5x0.5mm, 1sp - ALC050505S1 Presses 1% of range)

1% of range)

because all pressing dies are made by high-stretched carbon steel for achieving high hardness to meet the essential requirements of making ceramic or metal samples

Note: How to achieve finer or desired particles via ball mill is a research project

evaporation rate: 0

Please clean the mould via ethanol after the completion of each experiment

Al2O3 Sapphire Wafer, C-plane (0001), 5x5x0.5mm, 1sp - ALC050505S1 Presses 1% of range)Features: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 5 mm x 5 mm x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. C plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with Ra < 5 A 1 side polished Package: Each wafer is packed in 1000 class clean room with